Company name: CS CLEAN SYSTEMS
Products & Services made or distributed: cleansystems, exhaust gas management, emergency gas release, environmental protection, gas, APCVD, plasma etch, nitride deposition, chamber clean, Applied Materials, Air Products, ammonia, phosgene, COCl2, Phosphane, arsine, Boron Tribromide, Boron Trichloride, Boron Trifluoride, Bromine, Br2, t Butylarsine, AsH2(C4H9), t Butylphosphine, carbon monoxide, Carbonyl chloride, chlorine, Chlorine Trifluoride, ClF3, Diborane, Dichlorosilane, Diethylzinc, Dimethylaluminumhydride, Al(CH3)3, Dinitrogen Monoxide, COF2, Phosphorylchloride, CHCl3, Al(C2H5)3, CHF3, Al(CH3)3, B(OCH3)3, BH2NH2, Arsenic Pentafluoride, AsF5, Arsenic Trichloride, Arsenic Trifluoride, AsF3, Chloropentafluoroethane, Pentafluoroethane, Chromium Hexacarbonyl, Dichlorodifluoromethane, CCl2F2, Diethyltelluride
Company Website: http://www.csclean.com
Address: 41583 Albrae Street
Country: United States
Telephone: 510. 651.270
Fax: 510. 651.270
Brief description: CS CLEAN SYSTEMS specializes in exhaust gas purification for semiconductor and optoelectronics industries since 1986.
Extended description: CS CLEAN SYSTEMS specializes in exhaust gas purification for semiconductor and optoelectronics industries. They use different technologies like chemisorption, modular canisters, safety features and control system. They serve industries in various purposes which includes diffusion, plasma etch, chemical vapour deposition, plasma chamber cleaning, ion implantation, silicon germanium epitaxy, compound semiconductors. The company is certified to ISO 9001 and ISO 14001.
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